Interconnect for an optoelectronic device

ABSTRACT

Interconnects for optoelectronic devices are described. For example, an interconnect for an optoelectronic device includes an interconnect body having an inner surface, an outer surface, a first end, and a second end. A plurality of bond pads is coupled to the inner surface of the interconnect body, between the first and second ends. A stress relief feature is disposed in the interconnect body. The stress relief feature includes a slot disposed entirely within the interconnect body without extending through to the inner surface, without extending through to the outer surface, without extending through to the first end, and without extending through to the second end of the interconnect body.

CROSS-REFERENCE TO RELATED APPLICATIONS

This application is a continuation of U.S. patent application Ser. No.12/893,765, filed Sep. 29, 2010, the entire contents of which are herebyincorporated by reference herein.

TECHNICAL FIELD

Embodiments of the present invention are in the field of renewableenergy and, in particular, interconnects for optoelectronic devices.

BACKGROUND

Light-emitting diode (LED) and photovoltaic (PV) devices are two commontypes of optoelectronic devices. Thermal management and assembly ofoptoelectronic systems, such as systems including LED and PV devices,may be considered when evaluating such systems for fabrication anddeployment. For example, the area of systems of devices with cellinterconnects is one area ripe for improvements in thermal management,stress management, and assembly. Challenges for the fabrication anddeployment of such systems include a possible need for a low resistancethermal path in the interconnect, as well as a flexible accommodation ofcells coupled to the interconnect.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1A illustrates a cross-sectional view of a laminated photovoltaicsystem, in accordance with an embodiment of the present invention.

FIG. 1B illustrates a plan view of a laminated photovoltaic system, inaccordance with an embodiment of the present invention.

FIG. 2 illustrates a plan view of an interconnect for an optoelectronicdevice, in accordance with an embodiment of the present invention.

FIG. 3 illustrates a cross-sectional view of an interconnect for anoptoelectronic device highlighting a vertical jog, in accordance with anembodiment of the present invention.

FIG. 4 illustrates an isometric view of an interconnect for anoptoelectronic device highlighting a solder preform, in accordance withan embodiment of the present invention.

FIG. 5 illustrates an isometric view of a portion of an optoelectronicsystem with an internal bypass diode, in accordance with an embodimentof the present invention.

FIG. 6 illustrates a coupling interconnect that can be split to providea pair of terminal interconnects, in accordance with an embodiment ofthe present invention.

DETAILED DESCRIPTION

Interconnects for optoelectronic devices are described herein. In thefollowing description, numerous specific details are set forth, such asspecific arrangements of stress relief features in interconnects, inorder to provide a thorough understanding of embodiments of the presentinvention. It will be apparent to one skilled in the art thatembodiments of the present invention may be practiced without thesespecific details. In other instances, well-known fabrication techniques,such as lamination techniques, are not described in detail in order tonot unnecessarily obscure embodiments of the present invention.Furthermore, it is to be understood that the various embodiments shownin the Figures are illustrative representations and are not necessarilydrawn to scale.

Disclosed herein are interconnects for optoelectronic devices. In oneembodiment, an interconnect for an optoelectronic device includes aninterconnect body including an inner surface, an outer surface, a firstend, and a second end. The interconnect also includes a plurality ofbond pads coupled to the inner surface of the interconnect body, betweenthe first and second ends. The interconnect also includes a stressrelief feature formed in the interconnect body, the stress relieffeature having a plurality of T-shaped slots, each T-shaped slotapproximately aligned with a corresponding one of the plurality of bondpads, the vertical portion of each T-shaped slot proximate to thecorresponding one of the plurality of bond pads, and the horizontalportion of each T-shaped slot distal from the corresponding one of theplurality of bond pads.

In one embodiment, an interconnect for an optoelectronic device includesan inner surface, an outer surface, a first end, and a second end. Theinterconnect also includes a plurality of bond pads coupled to the innersurface of the interconnect body, between the first and second ends. Theinterconnect also includes a feature formed in the interconnect body,the feature having a first L-shaped extension at the first end of theinterconnect body and a second L-shaped extension at the second end ofthe interconnect body, the horizontal bases of each of the first andsecond L-shaped extensions proximate to the inner surface and distalfrom the outer surface of the interconnect body.

In accordance with an embodiment of the present invention, aninterconnect with one or more stress relief or L-shaped features is usedto improve the reliability of a photovoltaic system and to allow forreduced stress levels in cell solder joints, cell interconnects, andin-laminate bypass diodes. In one embodiment, stress levels incomponents that are bonded to the interconnect and encapsulated within aphotovoltaic laminate are reduced. In an embodiment, designs forinterconnects described herein are improved over conventionalinterconnect designs, since the new designs account for the largecoefficient of thermal expansion and rapid increase in stiffness of anencapsulant exposed to low temperature.

In an embodiment, the stress relief features designed into theinterconnect address all components that are attached to theinterconnect. For example, a series of different structures integratedwithin a cell interconnect may be used to reduce stress where eachcomponent is attached as well as to reduce stresses that would developalong a series of interconnects. In one embodiment, the stress relieffeatures are designed to allow freedom of motion in the directions thecomponents will be strained due to large temperature excursions of anassociated photovoltaic system.

Encapsulants may typically be expected to reduce stress in aphotovoltaic (PV) laminate due to their low modulus of elasticity.However, in accordance with an embodiment of the present invention, atextremely low temperatures near outdoor extremes or in unheated airplanestorage cells, the encapsulant can approach its glass transitiontemperature. At the glass transition temperature, the modulus canincrease by three orders of magnitude. At this point, the encapsulantbecomes a stress driver within the package as it also has a very largethermal expansion coefficient. Thus, in an embodiment, stress relieffeatures are utilized and designed to reduce the effects of anencapsulant that is becoming stiff and contracting due to lowtemperatures.

A common challenge related to reliable operation of laminatedphotovoltaic systems can be the minimization of thermal stress thatdevelops during temperature excursions. An example of such a laminatedphotovoltaic system is provided in FIGS. 1A and 1B, in accordance withan embodiment of the present invention.

Referring to FIG. 1A, in a cross-sectional view, and to FIG. 1B, in aplan view, a typical laminated solar cell package 100 includes an arrayof semiconductor solar cells 102 joined by metal interconnects 104 thatare encapsulated within a polymer layer 106 between a glass superstrate108 and a flexible polymer backsheet 110. In order to improve systemperformance, a bypass diode 112 between cell interconnects 104 as wellas a heat sink 114 (via a thermal adhesive 116) may also be integrated,as shown in FIGS. 1A and 1B. Laminated solar cell packages alsocontemplated herein are solar cell packages such as those described inU.S. patent application Ser. No. 12/844,594 assigned to SunPowerCorporation, entitled “Optoelectronic Device with Bypass Diode,” filedon Jul. 27, 2010, the entire contents of which are hereby incorporatedby reference herein.

Typically, a photovoltaic designer may focus on the thermal expansionmismatch of the glass, copper interconnects and silicon cells as theprimary stress driver during thermal excursions, relying on the softpolymer encapsulant as a stress relieving feature. However, in anembodiment, at extremely cold temperatures the encapsulant oftenapproaches its glass transition temperature and the stiffness modulusmay increase by over two orders of magnitude. In addition to the rapidchange in stiffness, the polymer encapsulant may have a relatively highthermal expansion coefficient several times larger than glass andmetals. During these conditions, the typically soft encapsulant maybecome a major stress driver in the package.

Extremely cold temperatures are often realized overnight in outdoorenvironments as well as during transport in unheated airplane storagecells. In accordance with an embodiment of the present invention, forinitial qualification and increased reliability, it is thus crucial thatinterconnect designs are capable of reducing stress on the componentscoupled together, e.g., primarily the bypass diodes and cells. Inaddition to thermal stress, there may also be a need to maximize thethermal coupling between the bypass diode and a heat sink mounted to theback of a laminated package in order to prevent thermal failure of thediode when operating in bypass mode.

In an aspect of the present invention, stress induced by an encapsulantat low temperatures and all intermediate ranges is reduced byincorporating several stress relief features at each interlinkedcomponent, as well as by extending additional heat spreading surfaces toregions below a heat sink in close proximity to a diode attachmentpoint. For example, FIG. 2 illustrates a plan view of an interconnectfor an optoelectronic device, in accordance with an embodiment of thepresent invention.

Referring to FIG. 2, an interconnect 200 includes an interconnect body202 having an inner surface 204, an outer surface 206, a first end 208,and a second end 210. A plurality of bond pads 212 is coupled to theinner surface 204 of the interconnect body 202, between the first andsecond ends 208 and 210, respectively. In an embodiment, one or morestress relief features are formed in the interconnect body 202, asdescribed in more detail below.

In accordance with an embodiment of the present invention, referringagain to FIG. 2, the stress relief feature of interconnect 200 is anarrow slot C1 positioned in a location approximately equally betweenthe first and second ends 208 and 210, respectively. The narrow slot C1includes an opening at the inner surface 204 of the interconnect body202 and extending into the interconnect body 202, but not through to theouter surface 206.

In one embodiment, feature C1 is a narrow slot cut into the center ofthe interconnect 200 that allows the bending of the interconnect at itsmid-plane as needed if two cells (e.g., cells 250 and 252 partiallydepicted in FIG. 2) to which it is rigidly connected rotate to form aneffective V-shape (see arrow below C1 in FIG. 2). Such rotation may becommon given the periodic placement of interconnects down a linear arrayof cells, as depicted in FIG. 1B. In one embodiment, the length of C1 isdetermined based on the expected displacement of the cells and themaximum allowable stress in the interconnects and bond pads coupled tothe cells. In a specific embodiment, feature C1 is typically around 7millimeters for a 12 millimeter wide interconnect. However, if thelength of C1 is too long, it may restrict electrical current flow andadd excessive Ohmic losses. In one embodiment, the width of C1 isdetermined based on the manufacturing tolerances associated withpunching or stamping operations as well as the need to reduce stress atthe tip of the narrow slot. In a specific embodiment, a typical widthfor feature C1 is approximately in the range of 0.5-1 millimeters, andthe tip is a fully rounded semicircle to reduce stress concentrations. Asmall width may also limit the length of an Ohmic bottleneck, which mayconduct the full photocurrent of a string of cells.

In accordance with an embodiment of the present invention, referringagain to FIG. 2, the stress relief feature of interconnect 200 is aplurality of T-shaped slots C2, each T-shaped slot C2 approximatelyaligned with a corresponding one of the plurality of bond pads 212. Thevertical portion 220 of each T-shaped slot C2 is proximate to thecorresponding one of the plurality of bond pads 212, and the horizontalportion 222 of each T-shaped slot C2 is distal from the correspondingone of the plurality of bond pads 212.

In one embodiment, feature C2 is a T-shaped slot in the interconnect 200that allows both rotation and normal displacement of the interconnect200 relative to a cell (e.g., cell 250 or 252). At extremely coldtemperatures, an encapsulant may approach its glass transitiontemperature and, due to its high thermal expansion coefficient, act as astress driver. Surprisingly, in this condition, the encapsulant may pullan interconnect closer to a cell. In one embodiment, feature C2 thusallows for a small deformation of the interconnect 200 towards a cell torelax strain in the encapsulant, limiting the stress at thecell-interconnect bond. In a specific embodiment, each of the threeconnections to a cell (e.g., the three connections on the right side ofinterconnect 200 made to cell 252) contributes approximately one-thirdof the cumulative photocurrent being conducted in the string. Betweenand below these connections, the current may flow substantially in thewider portion of the interconnect 200 below the C2 features. As such, ana particular embodiment, the I²R losses associated with such featuresare low.

In accordance with an embodiment of the present invention, referringagain to FIG. 2, the stress relief feature of interconnect 200 is avertical jog C3 near to or at the location where one of the plurality ofbond pads 212 is coupled to the inner surface of the interconnect body202. FIG. 3 illustrates a cross-sectional view of an interconnect for anoptoelectronic device highlighting a vertical jog, in accordance with anembodiment of the present invention.

Referring to FIG. 3, in one embodiment, feature C3 is a vertical jog inthe interconnect 200 that creates an out-of-plane mechanical couplingthat reduces stress when the interconnect 200 is pulled closer to a cell(e.g., cell 252) by an encapsulant 390. In addition, in a specificembodiment, the thinner region not only further reduces the stressbetween the cell 252 and interconnect 200 but also reduces verticalheight differential between a heat sink 392, cell 252, and interconnect200, reducing thermal resistance from the cell 252 and an associateddiode to ambient.

Furthermore, in an embodiment, referring to FIG. 4, solder performs 499can be added to the cell bond pads 212 of the interconnect 200. In oneembodiment, by preprocessing a solder pad onto the interconnect 200, thestringing or wiring of an array of cells can be performed at a muchhigher throughput and with a much tighter process control than bydispensing solder paste during cell-to-interconnect soldering. Inaccordance with an embodiment of the present invention, referring againto FIG. 2, the stress relief feature of interconnect 200 is acombination of slots D1. D1 includes a first narrow slot in a locationproximate to the second end 210 and distal from the first end 208 ofinterconnect 200. The first narrow slot includes an opening at the outersurface 206 of the interconnect body 202 and extending into theinterconnect body 202, but not through to the inner surface 204. D1 alsoincludes a second narrow slot between the first narrow slot and thesecond end 210. The second narrow slot is between and orthogonal to theinner and outer surfaces 204 and 206, respectively, but does not openinto either of the inner and outer surfaces 204 and 206. Furthermore,the second narrow slot is coupled to the horizontal portion of anouter-most T-shaped slot C2 of the plurality of T-shaped slots, asdepicted in FIG. 2.

In one embodiment, feature D1 is specifically designed to allow the ends208 and 210 of the interconnect 200 to extend or retract to reducestress on a diode package and to reduce any long-range stresses thatmight develop down an entire length of an array of cells. In a specificembodiment, feature D1 includes both the straight slot from the outsideedge 206 of the interconnect 200 and the additional slot added to theT-shaped slot C2 at each bond pad 212. In a specific embodiment, featureD1 also allows expansion of the joints between a diode and interconnect200 during the soldering or bonding assembly operations. If a solderingstep is used to attach the diodes without feature D1, stress mayincrease as the components cool down from the soldering temperature. Ina particular embodiment, for a long string of several interconnects anddiodes, such stress is otherwise appreciable and would otherwise resultin early failure of the diodes during lamination as well as indisplacement of the cells from nominal positions.

In one embodiment, in the standard operating mode of the cells, featureD1 has a minimal electrical impact on the circuit as there is nearlyzero electrical current flowing through the diode. The cell connectionsare oriented such that the outermost regions (left and right ends) ofthe interconnect 200 conduct approximately one-third of the cumulativephotocurrent generated by the cells. As a result, in an embodiment, theI²R losses near feature D1 are substantially less than they would be ifthis feature were placed closer to the center of the interconnect 200where a higher current always flows even when the diode is not in bypassmode. When the diodes are in bypass mode, the full string photocurrentmay flow through and around feature D1. Thus, in an embodiment, D1becomes a larger source of electrical losses. However, these losses aresmall compared to the power dissipation otherwise within the diode inbypass mode.

In accordance with an embodiment of the present invention, referringagain to FIG. 2, interconnect 200 includes a feature T1 formed in theinterconnect body 202. The feature T1 includes a first L-shapedextension at the first end 208 of the interconnect body 202, and asecond L-shaped extension at the second end 210 of the interconnect body202. The horizontal bases of each of the first and second L-shapedextensions are proximate to the inner surface 204 and distal from theouter surface 206 of the interconnect body 202.

In one embodiment, feature TI is designed to increase thermal couplingbetween a diode and a heat sink that extends partially over theinterconnect 202. For example, FIG. 5 illustrates an isometric view of aportion of an optoelectronic system with an internal bypass diode, inaccordance with an embodiment of the present invention.

Referring to FIG. 5, in one embodiment, the L-shaped extension (or pairof extensions) to the interconnect 200 allows additional heat sink 392fin coupling in close proximity to a diode (e.g., a cell 500 bypassdiode) 502, thus reducing the thermal gradient to ambient for a diodeoperating in bypass mode. In a specific embodiment, the reducedtemperature of the diode 502 also helps reduce any thermal stress thatwould develop due to an otherwise localized hot spot. In an embodiment,the L-shaped extension is an extended area for increased thermalcoupling between an interconnect and a heat sink mounted to anoptoelectronic system.

It is to be understood that different combinations, or even solo use of,one or more of the above features and stress relief features may beincluded in an interconnect. For example, in an embodiment, aninterconnect for an optoelectronic device includes an interconnect bodyincluding an inner surface, an outer surface, a first end, and a secondend. A plurality of bond pads is coupled to the inner surface of theinterconnect body, between the first and second ends. A stress relieffeature is formed in the interconnect body. The stress relief featureincludes a plurality of T-shaped slots, each T-shaped slot approximatelyaligned with a corresponding one of the plurality of bond pads, thevertical portion of each T-shaped slot proximate to the correspondingone of the plurality of bond pads, and the horizontal portion of eachT-shaped slot distal from the corresponding one of the plurality of bondpads.

In another embodiment, an interconnect for an optoelectronic deviceincludes an interconnect body having an inner surface, an outer surface,a first end, and a second end. A plurality of bond pads is coupled tothe inner surface of the interconnect body, between the first and secondends. A feature is formed in the interconnect body, the feature having afirst L-shaped extension at the first end of the interconnect body and asecond L-shaped extension at the second end of the interconnect body.The horizontal bases of each of the first and second L-shaped extensionsare proximate to the inner surface and distal from the outer surface ofthe interconnect body.

In another embodiment, an interconnect for an optoelectronic deviceincludes an interconnect body having an inner surface, an outer surface,a first end, and a second end. A plurality of bond pads is coupled tothe inner surface of the interconnect body, between the first and secondends. A stress relief feature is formed in the interconnect body, thestress relief feature having a plurality of T-shaped slots, eachT-shaped slot approximately aligned with a corresponding one of theplurality of bond pads. The vertical portion of each T-shaped slot isproximate to the corresponding one of the plurality of bond pads. Thehorizontal portion of each T-shaped slot is distal from thecorresponding one of the plurality of bond pads. The interconnect alsoincludes a first L-shaped extension at the first end of the interconnectbody. A second L-shaped extension is at the second end of theinterconnect body. The horizontal bases of each of the first and secondL-shaped extensions are proximate to the inner surface and distal fromthe outer surface of the interconnect body.

In one embodiment, the stress relief feature further includes a firstnarrow slot in a location approximately equally between the first andsecond ends. The first narrow slot has an opening at the inner surfaceof the interconnect body and extends into the interconnect body, but notthrough to the outer surface. The stress relief feature further includesa second narrow slot in a location proximate to the first end and distalfrom the second end. The second narrow slot has an opening at the outersurface of the interconnect body and extends into the interconnect body,but not through to the inner surface. The stress relief feature furtherincludes a third narrow slot between the second narrow slot and thefirst end. The third narrow slot is between and orthogonal to the innerand outer surfaces, but does not open into either of the inner and outersurfaces. Also, the third narrow slot is coupled to the horizontalportion of an outer-most T-shaped slot of the plurality of T-shapedslots. The stress relief feature further includes a vertical jog near toor at the location where one of the plurality of bond pads is coupled tothe inner surface of the interconnect body.

In accordance with an embodiment of the present invention, aninterconnect contemplated herein is a coupling interconnect. Thecoupling interconnect may be used to couple two optoelectronic cells, asdescribed above in association with FIGS. 2, 4 and 5. However, inanother embodiment, the interconnect is a terminal interconnect. Forexample, FIG. 6 illustrates a coupling interconnect that can be split toprovide a pair of terminal interconnects, in accordance with anembodiment of the present invention.

Referring to FIG. 6, a coupling interconnect 600 includes a first half602 and a second, symmetrical half 604 joined at a location 606 with thefirst half 602. Coupling interconnect 600 includes stress relieffeatures 608 and other features described above, such as L-shapedfeatures 610. Coupling interconnect 600 may be split along axis 612 toprovide two terminal interconnects.

In association with the discussion of FIGS. 2-4 and 6 above, a pluralityof interconnects, such as interconnect 200 or 600, may be included in anoptoelectronic system. Thus, in accordance with an embodiment of thepresent invention, an optoelectronic system includes a plurality ofpairs of optoelectronic devices. In one embodiment, each optoelectronicdevice is a back-contact solar cell. The optoelectronic system alsoincludes a plurality of bypass diodes, one or more of the bypass diodesdisposed between each of the pairs of optoelectronic devices. Theoptoelectronic system also includes a plurality of heat spreader units,one or more of the heat spreader units disposed above, and extendingover, each of the bypass diodes. The optoelectronic system also includesa plurality of heat sinks, one or more of the heat sinks disposed aboveeach of the heat spreader units. In an embodiment, the optoelectronicsystem, interconnects or pairs of interconnects are disposed betweenpairs of optoelectronic devices, such as pairs of solar cells. In oneembodiment, one or more of the interconnects has one or more of a stressrelief feature and an L-shaped feature, such as the stress relieffeatures and L-shaped features described above in association withinterconnects 200 and 600.

In accordance with an embodiment of the present invention, a method offabricating an interconnect for an optoelectronic device includesforming an interconnect body having an inner surface, an outer surface,a first end, a second end, and a plurality of bond pads coupled to theinner surface of the interconnect body, between the first and secondends. The method further includes forming one or more stress relieffeatures and L-shaped features in the interconnect body, such as thestress relief features and L-shaped features described above inassociation with interconnects 200 and 600.

Thus, interconnects for optoelectronic devices have been disclosed. Inaccordance with an embodiment of the present invention, an interconnectfor an optoelectronic device includes a stress relief feature. In oneembodiment, the interconnect includes an interconnect body having aninner surface, an outer surface, a first end, and a second end. Aplurality of bond pads is coupled to the inner surface of theinterconnect body, between the first and second ends. A stress relieffeature is formed in the interconnect body. The stress relief featureincludes a plurality of T-shaped slots, each T-shaped slot approximatelyaligned with a corresponding one of the plurality of bond pads, thevertical portion of each T-shaped slot proximate to the correspondingone of the plurality of bond pads, and the horizontal portion of eachT-shaped slot distal from the corresponding one of the plurality of bondpads. In accordance with another embodiment of the present invention, aninterconnect for an optoelectronic device includes an L-shaped feature.In one embodiment, an interconnect includes an interconnect body havingan inner surface, an outer surface, a first end, and a second end. Aplurality of bond pads is coupled to the inner surface of theinterconnect body, between the first and second ends. A feature isformed in the interconnect body, the feature having a first L-shapedextension at the first end of the interconnect body and a secondL-shaped extension at the second end of the interconnect body. Thehorizontal bases of each of the first and second L-shaped extensions areproximate to the inner surface and distal from the outer surface of theinterconnect body.

What is claimed is:
 1. An interconnect for an optoelectronic device, theinterconnect comprising: an interconnect body comprising an innersurface, an outer surface, a first end, and a second end; a plurality ofbond pads coupled to the inner surface of the interconnect body, betweenthe first and second ends; and a stress relief feature disposed in theinterconnect body, the stress relief feature comprising a first narrowslot disposed entirely within the interconnect body without extendingthrough to the inner surface, without extending through to the outersurface, without extending through to the first end, and withoutextending through to the second end of the interconnect body, the firstnarrow slot positioned in a location approximately equally between thefirst and second ends, the first narrow slot comprising an opening atthe inner surface of the interconnect body and extending into theinterconnect body, but not through to the outer surface.
 2. Theinterconnect of claim 1, wherein the stress relief feature furthercomprises a second narrow slot in a location proximate to the first endand distal from the second end, the second narrow slot comprising anopening at the outer surface of the interconnect body and extending intothe interconnect body, but not through to the inner surface, and a thirdnarrow slot between the second narrow slot and the first end, the thirdnarrow slot between and orthogonal to the inner and outer surfaces, butnot opening into either of the inner and outer surfaces.
 3. Theinterconnect of claim 1, wherein the stress relief feature furthercomprises a vertical jog near to or at the location where one of theplurality of bond pads is coupled to the inner surface of theinterconnect body.
 4. The interconnect of claim 1, wherein the stressrelief feature further comprises: a second narrow slot in a locationproximate to the first end and distal from the second end, the secondnarrow slot comprising an opening at the outer surface of theinterconnect body and extending into the interconnect body, but notthrough to the inner surface; a third narrow slot between the secondnarrow slot and the first end, the third narrow slot between andorthogonal to the inner and outer surfaces, but not opening into eitherof the inner and outer surfaces; and a vertical jog near to or at thelocation where one of the plurality of bond pads is coupled to the innersurface of the interconnect body.
 5. The interconnect of claim 1,wherein the interconnect is a coupling interconnect.
 6. The interconnectof claim 1, wherein the interconnect is a terminal interconnect.
 7. Aninterconnect for an optoelectronic device, the interconnect comprising:an interconnect body comprising an inner surface, an outer surface, afirst end, and a second end; a plurality of bond pads coupled to theinner surface of the interconnect body, between the first and secondends; a stress relief feature disposed in the interconnect body, thestress relief feature comprising a first narrow slot disposed entirelywithin the interconnect body without extending through to the innersurface, without extending through to the outer surface, withoutextending through to the first end, and without extending through to thesecond end of the interconnect body, the first narrow slot positioned ina location approximately equally between the first and second ends, thefirst narrow slot comprising an opening at the inner surface of theinterconnect body and extending into the interconnect body, but notthrough to the outer surface; a first L-shaped extension at the firstend of the interconnect body; and a second L-shaped extension at thesecond end of the interconnect body, the horizontal bases of each of thefirst and second L-shaped extensions proximate to the inner surface anddistal from the outer surface of the interconnect body.
 8. Theinterconnect of claim 7, wherein the stress relief feature furthercomprises a second narrow slot in a location proximate to the first endand distal from the second end, the second narrow slot comprising anopening at the outer surface of the interconnect body and extending intothe interconnect body, but not through to the inner surface, and a thirdnarrow slot between the second narrow slot and the first end, the thirdnarrow slot between and orthogonal to the inner and outer surfaces, butnot opening into either of the inner and outer surfaces.
 9. Theinterconnect of claim 7, wherein the stress relief feature furthercomprises a vertical jog near to or at the location where one of theplurality of bond pads is coupled to the inner surface of theinterconnect body.
 10. The interconnect of claim 7, wherein the stressrelief feature further comprises: a second narrow slot in a locationproximate to the first end and distal from the second end, the secondnarrow slot comprising an opening at the outer surface of theinterconnect body and extending into the interconnect body, but notthrough to the inner surface; a third narrow slot between the secondnarrow slot and the first end, the third narrow slot between andorthogonal to the inner and outer surfaces, but not opening into eitherof the inner and outer surfaces; and a vertical jog near to or at thelocation where one of the plurality of bond pads is coupled to the innersurface of the interconnect body.
 11. The interconnect of claim 7,wherein the interconnect is a coupling interconnect.
 12. Theinterconnect of claim 7, wherein the interconnect is a terminalinterconnect.
 13. An interconnect for an optoelectronic device, theinterconnect comprising: an interconnect body comprising an innersurface, an outer surface, a first end, and a second end; a plurality ofbond pads coupled to the inner surface of the interconnect body, betweenthe first and second ends; and a stress relief feature disposed in theinterconnect body, the stress relief feature comprising a slot disposedentirely within the interconnect body without extending through to theinner surface, without extending through to the outer surface, withoutextending through to the first end, and without extending through to thesecond end of the interconnect body, wherein the stress relief featurefurther comprises a vertical jog near to or at the location where one ofthe plurality of bond pads is coupled to the inner surface of theinterconnect body.
 14. The interconnect of claim 13, wherein the stressrelief feature further comprises a first narrow slot in a locationproximate to the first end and distal from the second end, the firstnarrow slot comprising an opening at the outer surface of theinterconnect body and extending into the interconnect body, but notthrough to the inner surface, and a second narrow slot between the firstnarrow slot and the first end, the second narrow slot between andorthogonal to the inner and outer surfaces, but not opening into eitherof the inner and outer surfaces.
 15. The interconnect of claim 13,wherein the interconnect is a coupling interconnect.
 16. Theinterconnect of claim 13, wherein the interconnect is a terminalinterconnect.